HISTORY
·
The Rockwell Solid State
Electronics Laboratory (RSSEL) was established in 1977 with assistance from
Rockwell International, NASA and Cornell University.
The Laboratory has been developed as a vertically-integrated research
facility, capable of producing high quality III-V semiconducting materials,
characterizing these materials and fabricating devices.
Faculty in the Department of Electrical Engineering have maintained the
educational and research goals of the RSSEL.
·
The Rockwell Solid State Electronics Laboratory will
provide a vertically-integrated laboratory environment for performing
semiconductor material and device research, primarily in the area of compound
semiconductors. The participants
are faculty and students (graduate and undergraduate) in the Department of
Electrical Engineering. These
research activities are correlated with the graduate academic program in the
Department of Electrical Engineering. Participation
by other engineering and science academic units is welcomed.
·
To
provide a laboratory setting for the processing of compound, alloy, and
elemental semiconductor materials by various epitaxial growth and deposition
processes.
·
To provide facilities for the characterization of
semiconductor materials.
· To provide facilities for the fabrication of devices based upon semiconductor materials.
·
To
maintain a funding base through research grants and contracts to maintain the
laboratory facilities, and to provide for enhancement, replacement and
improvement of the facilities.
·
To provide a research environment for the interaction of
faculty and students.
·
To produce research results which may be presented to the
technical/scientific community.
Microelectronics
Fabrication Laboratory:
The Microelectronics Fabrications Laboratory (MFL)
has been developed as an instructional laboratory for the presentation of
silicon device processing techniques in the courses ELEN 614 and ELEN 615.
This facility was partially funded by the Microelectronics Center of
North Carolina (MCNC). The MFL
equipment includes contact photolithography, oxidation/diffusion furnaces,
electron beam evaporation, and materials and device characterization
(ellipsometry, current-voltage, capacitance-voltage, surface profiling, and
optical microscopy). The
various instruments are also utilized in research programs within the
Department of Electrical Engineering and the University.
A remote RF plasma chemical vapor deposition system for the
deposition of amorphous silicon compounds provides some research effort in
this Laboratory.
If you have any
questions, contact Dr.
Ward J. Collis