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Deposition and Device Fabrication Facilities

1.   RF Sputtering System

2.   Electron beam evaporators, with cryopump vacuum systems, multiple-pocket hearths, single quartz crystal thickness/rate monitors.

3.       Ellipsometer

4.    Photomask aligner

5.     Photoresist application and development systems.

6.      Annealing/alloying furnaces (2), fused silica tubes, inert gas or hydrogen ambient.

7.      A remote plasma etching system for III-V semiconductors

8.     2 Millipore DI water systems.

9.     Various digital multimeters, programmable current source, electrometer, power supplies and     recorders for materials and device characterization.

10.     5 Exhaust fume hoods for chemical etching, cleaning, etc.

11.    Various digital multimeters, Model 450 Gaussmeter with metal transverse gaussmeter probe, electrometer, power supplies and recorders for materials and device characterization

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